1. 학력

2016 B.S. 재료공학, 서울대학교

2021 Ph.D. 재료공학, 서울대학교

2. 경력

2014 - 2015 인턴, SK Hynix

2021 - 2023 박사후 연구원, 서울대학교 반도체공동연구소

2023 - 2024 박사후 연구원, imec

2024 - 현재 조교수, 숙명여자대학교 화공생명공학부

3. 전공분야

박막공학, 반도체 공정, 메모리 소자

4. 연구분야

Thin film, Atomic layer deposition, Memory device, DRAM and FeRAM capacitor, interfacial engineering

5. 주요 논문

D. S. Kwon*, J. Bizindavyi, G. De, A. Belmonte, A. Delabie, L. Nyns, G. S. Kar, J. Van Houdt, M. I. Popovici

"Improvement of the Ferroelectric Response of La-Doped Hafnium Zirconium Oxide Employing Tungsten Oxide Interfacial Layer with Back-End-of-Line Compatibility"

ACS Applied Materials and Interfaces, 16(31), 41704-41715 (2024)

D. S. Kwon, T. K. Kim, J. Lim, H. Seo, H. Paik, and C. S. Hwang*

“Enhanced Electrical Properties of Al-doped TiO2 Dielectric Film on the TiN Electrode by Adopting Atomic Layer Deposited Ru Interlayer”

ACS Applied Electronic Materials, 4(4), 2005-2014 (2022)

D. S. Kwon, W. Jeon, D. G. Kim, T. K. Kim, H. Seo, J. Lim, and C. S. Hwang*

“Improved Properties of the Atomic Layer Deposited Ru Electrode for Dynamic Random-Access Memory Capacitor Using Discrete Feeding Method”

ACS Applied Materials and Interfaces, 13(20), 23915-23927 (2021)

D. S. Kwon, C. H. An, S. H. Kim, D. G. Kim, J. Lim, W. Jeon*, and C. S. Hwang*

“Atomic Layer Deposition of Ru Thin Films Using (2,4-dimethyloxopentadienyl)(ethylcyclopentadienyl)Ru and the Effect of Ammonia Treatment during the Deposition”

Journal of Materials Chemistry C, 8(21), 6993-7004 (2020)